Manual /Automatic Sliding Dual-Zone/Multi-Zone PECVD System
- Product Description
- Technical Specifications
- Contact Us
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Sales Hotline: 15122725930
Product用途:
Product Expertise:
A PECVD system uses radio frequency to ionize a gas containing the atoms that constitute the thin film, thereby generating a localized plasma. Due to its high chemical reactivity, the plasma readily undergoes reactions, leading to the deposition of the desired thin film on the substrate.
Product Composition:
PECVD System Configuration:
1. 1200°C Open-Type Dual-Zone Vacuum Tube Furnace
2. Plasma Radio Frequency Power Supply
3. Multi-Channel Mass Flow Control System
4. Vacuum System (optional: medium vacuum or high vacuum)
Product Features:
Low growth temperature; fast deposition rate; excellent film quality; wide applicability; simple equipment.

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Please contact customer service for detailed technical solutions!
Sales Hotline: 15122725930 (WeChat)
Email: CTJZH@CTJZH.COM
Website: WWW.CTJZH.COMContact Address: No. 11, Shuangchuan Road, Beichen Science and Technology Park, Tianjin
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Contact Us Content
Service hotline: 15122725930 (WeChat)
Email: ctjzh2828@126.com
Website: www.ctjzh.com
Contact Address: No. 11, Shuangchuan Road, Beichen Science and Technology Park, Tianjin
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