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  • 1200℃滑动双温区PECVD系统.png

Manual /Automatic Sliding Dual-Zone/Multi-Zone PECVD System

Product Applications: Product Specialization: The PECVD system uses radio frequency to ionize gases containing the atoms that constitute the thin film, thereby generating a localized plasma. This plasma exhibits high chemical reactivity, readily undergoing reactions to deposit the desired thin film onto the substrate.

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  • Product Description
  • Technical Specifications
  • Contact Us
  • Sales Hotline: 15122725930 

     

    Product用途:

    Product Expertise:

    A PECVD system uses radio frequency to ionize a gas containing the atoms that constitute the thin film, thereby generating a localized plasma. Due to its high chemical reactivity, the plasma readily undergoes reactions, leading to the deposition of the desired thin film on the substrate.

     

    Product Composition:

    PECVD System Configuration:

    1. 1200°C Open-Type Dual-Zone Vacuum Tube Furnace

    2. Plasma Radio Frequency Power Supply

    3. Multi-Channel Mass Flow Control System

    4. Vacuum System (optional: medium vacuum or high vacuum)

     

    Product Features:

    Low growth temperature; fast deposition rate; excellent film quality; wide applicability; simple equipment.

  • Please contact customer service for detailed technical solutions!

    Sales Hotline: 15122725930 (WeChat)

    Email: CTJZH@CTJZH.COM
    Website: WWW.CTJZH.COM

    Contact Address: No. 11, Shuangchuan Road, Beichen Science and Technology Park, Tianjin

  • Contact Us Content

    Service hotline: 15122725930 (WeChat)

     

    Email: ctjzh2828@126.com

    Website: www.ctjzh.com

     

    Contact Address: No. 11, Shuangchuan Road, Beichen Science and Technology Park, Tianjin

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