RTP Sliding Rapid Annealing Furnace
- Product Description
-
Product用途:
This electric furnace employs infrared lamp heating and features a sliding furnace chamber for rapid cooling. It is used for annealing semiconductor and solar-cell wafers, as well as for a variety of process trials, including rapid thermal annealing, rapid thermal oxidation, rapid thermal nitridation, silicide alloy annealing, electrode alloying, oxide growth, post-implantation annealing, and thin-film deposition.
Product Features:
By rapidly moving the furnace chamber across various environments—such as vacuum, inert atmosphere, or ambient air—and incorporating a powerful forced-air cooling system, the equipment enables fast heating and cooling of samples. It offers high temperature-control accuracy with a maximum heating rate of 30°C/s. Its compact benchtop design features quick-connect flanges, minimizing the risk of damage to the furnace tube during installation and ensuring convenient operation.
Technical Specifications:
Product Name
RTP Sliding-Type Rapid Annealing Furnace
Product Model
RTP-G11103- K
Rated power
9KW
Maximum temperature
10 00℃
Operating temperature
95 0°C (＜ 1 hour )
Quartz Pipe size
Phi 110 *360 mm
Heating zone length
190mm
Constant-temperature zone length
100mm
Heating element
Infrared lamp tube
Temperature control
Domestically produced programmable temperature control system Editable 50-step program-controlled temperature setting
Temperature control Set the degree
±1℃
Furnace tube material
Quartz tube
Sliding distance
355mm
Swipe method
Manual
Suggestion Heating and cooling rate degree
30 degrees Celsius -50 °C/min
External dimensions
565*960*665
Keywords:
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Contact Information
Address: No. 11 Shuangchuan Road, Tianjin Beichen Science and Technology Park
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