Product application:

This CVD system is suitable for CVD processes, such as silicon carbide coating, conductivity testing of ceramic substrates, and control of ZnO nanostructures

Growth, ceramic capacitor (MLCC) atmosphere sintering vacuum quenching annealing, rapid cooling and other process experiments.

Product Composition:

CVD system configuration:

1.1200 degrees open vacuum tube furnace (optional multi-temperature zone).

2. Sliding system is divided into manual and electric sliding, and equipped with air cooling system.

3. Multi-channel mass flow control system

4. Vacuum system (optional medium or high vacuum)

Product Features:

1 Control circuit adopts fuzzy PID program control technology, the technology of high temperature control accuracy, small thermal inertia, temperature impulse, reliable performance, simple operation.

2 Gas fast connection flange structure adopts the company's unique intellectual property patent design to improve the convenience of operation.

3 The vacuum system has the function of automatic vacuum upper and lower limit control, the high vacuum system adopts the high pressure strong, impact resistant molecular pump, prevent the accidental leakage caused by molecular pump damage, prolong the service life of the system.

4 (electric) sliding system adopts temperature controller to automatically control the movement of the furnace body, and when the program is completed, the furnace body will slide at the set speed. Due to the sliding limit function, the furnace body will not collide. After the sample is exposed to the furnace body, it will be cooled rapidly through the air cooling system.