Product application: Specialty of products: The PECVD system uses radio frequency to ionize the gas containing the constituent atoms of the film to form a plasma locally. The plasma is highly chemically active and easy to react, depositing the desired film on the substrate. Product Composition: PECVD system configuration: 1.1200 degrees open double temperature zone vacuum tube furnace 2. Plasma RF power supply 3. Multi-channel mass flow control system 4. Vacuum system (optional medium or high vacuum) Product Features: Low growth temperature; Fast deposition rate; Good film forming quality, wide application range, simple equipment.

• sliding
• the
• system
• film
• vacuum
• product
• to
• plasma
• of
• temperature