1200°C PECVD System
- Product Description
- Technical Specifications
- Contact Us
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15122725930 (WeChat)
Product Uses
PECVD The system uses radio frequency to ionize a gas containing atoms that constitute the thin film, thereby generating a localized plasma. Due to its high chemical reactivity, the plasma readily undergoes reactions, leading to the deposition of the desired thin film onto the substrate.
Product Composition
PECVD System configuration;
1.1200 Open-Door Sliding Single-Zone Vacuum Tube Furnace
2. Plasma Radio Frequency Power Supply
3. Multi-channel Mass Flow Control System
4. Vacuum System (Sold Separately)
Product Features
Wide power supply range; broad temperature range; long sputtering area; fully adjustable tube; compact and refined design with excellent cost-performance; capable of rapid heating and cooling—making it an ideal choice for laboratory growth of graphene films, metal films, ceramic films, composite films, and more. It can also be used as an extended plasma cleaning and etching system.
System Name
Integrated PECVD System
1200 Small °C PECVD System
System Model
PECVD-12IH-500A
PECVD-12IH-4Z/G
Control Method
LCD micro Programmable Logic Controller Control System
Manual
Temperature
1200 degrees Celsius
Heating zone length
200mm
Constant-temperature zone length
100mm
Temperature zone
Single temperature zone
Quartz tube diameter
Phi 60mm
Phi 50mm
Rated power
1.2Kw
2Kw
Rated voltage
220V
Sliding method and distance
Auto-scroll ;200mm
Manual sliding ;200mm
Temperature control
30 Programmed temperature control
50 Programmed temperature control
Control accuracy
plus or minus 1 degrees Celsius
Furnace tube operating temperature
< 1200 degrees Celsius
Air line flange
Adopts multi-ring sealing technology for quick clamp connection.
Exhaust Cooling Unit
Advanced air insulation technology, combined with thermal sensing technology, ensures that when the furnace surface temperature rises to 50 At ℃,
The temperature-control fan will automatically start, rapidly cooling the furnace surface.
Gas control method
Mass Flow Meter (Button-Type)
Number of gas lines
2 Road ( 2-4 Road)
4 Piping (number of air lines can be customized based on specific requirements)
Flow range
0–500 sccm ( Standard milliliter / (Optionally available) Nitrogen calibration
Accuracy
plus or minus 1% F.S.
Response time
1sec
Operating Temperature (Flow Meter)
20-120 degrees Celsius
Work stress
Intake pressure 0.05–0.3 MPa ( Gauge pressure)
Intake method
Adopts an anti-backflow design.
Specifications
Medium vacuum (integrated type must be purchased separately)
System vacuum range
10Pa-100Pa
Vacuum pump
Theoretical Ultimate Vacuum of a Two-Stage Mechanical Pump 3x10 -1 Pa , pumping speed 4L/S (Optional: Other pumping-speed vacuum pumps) , The exhaust outlet is equipped with an oil mist filter, rated voltage 220V , power 0.55Kw
Signal frequency
13.56 MHz ± 0.005%
Power Output Range
0W-500W
0W-100W
Reflected Power
350W
30W
RF output interface
50 Omega, N-type, female
Power stability
plus or minus 0.1%
Harmonic component
less than or equal to -50dbc
Supply voltage
Single-phase AC ( 187V-253V) Frequency 50/60HZ
Total machine power
greater than or equal to 70%
Screen display
Forward power, tuner capacitor position, bias voltage value
Furnace external dimensions
290×350×340mm
290×350×495mm
System external dimensions
420×1440×1100mm
530×2310×750mm
Total system weight
270Kg
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Please contact customer service for detailed technical solutions!
Sales Hotline: 15122725930 (WeChat)
Email: CTJZH@CTJZH.COM
Website: WWW.CTJZH.COMContact Address: No. 11, Shuangchuan Road, Beichen Science and Technology Park, Tianjin
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Contact Us Content
Service hotline: 15122725930 (WeChat)
Email: ctjzh2828@126.com
Website: www.ctjzh.com
Contact Address: No. 11, Shuangchuan Road, Beichen Science and Technology Park, Tianjin
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Address: No. 11 Shuangchuan Road, Tianjin Beichen Science and Technology Park
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